| 摘要 |
<p>A radiation sensitive composition for fabricating a spacer for crystal display device is provided to form the spacer which exhibits excellent elastic recovery, rubbing resistance, adhesiveness to a transparent wafer and heat resistance, and superior resistance against a stripping solution during stripping of an alignment layer. The composition includes a polymer obtained by reacting a copolymer comprising: (a1) unsaturated carboxylic acid and carboxylic anhydride; (a2) an unsaturated compound containing one hydroxyl group per molecule; and (a3) polymer obtained by reacting copolymer of another unsaturated compound with isocyanate compound represented by a formula(1), wherein R1,R2 and R3 are independently hydrogen or a group with specific formula(I) or (II), provided that R1,R2 and R3 are not simultaneously hydrogen, and a, b and c are independently integer of 0 to 12. The composition further includes a polymeric unsaturated compound and a radiation sensitive polymerization initiator.</p> |
