| 摘要 |
A semiconductor etching apparatus having a heater is provided to uniformly maintain the temperature of a process chamber by installing a temperature sensor in the outer surface of a bell jar for making the process chamber maintain a vacuum state and by increasing or decreasing the temperature of gas that is injected to a gap between the bell jar and a resonator according to a temperature detected by the temperature sensor. A pedestal on which a wafer is placed is included in a process chamber(210). The vacuum state of the process chamber is maintained by a bell jar(220). The bell jar is covered with a resonator(240). First gas is supplied to the process chamber by a first gas supply line. The first gas is supplied to the first gas supply line by a first gas supply part. A temperature adjusting part detects the temperature of the bell jar and supplies second gas for adjusting the temperature of the process gas to a space part between the bell jar and the resonator according to the detected temperature so that the temperature of the process chamber is uniformly maintained. The first gas is an etching gas different from the second gas. The first gas can be Ar gas, and the second gas can be N2 gas.
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