CVD Apparatus for Depositing Poly Silicon,申请号KR20050039926-传众专利搜索

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发明名称	CVD Apparatus for Depositing Poly Silicon
摘要
申请公布号	KR100688837(B1)	申请公布日期	2007.03.02
申请号	KR20050039926	申请日期	2005.05.12
申请人		发明人
分类号	H01L21/205	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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