发明名称 ELECTRON EMISSION DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 An electron emission device and a manufacturing method thereof are provided to minimize an interval between a gate electrode and an electron emission portion by forming openings on an upper portion of an insulating layer. A electron emission device includes a substrate; a cathode(12) formed on the substrate; a gate electrode(14) formed on the substrate, with an insulating layer(30) being interposed between the cathode and the gate electrode; an electron emission portion(16) formed on the cathode and exposed through openings(32) each formed on the insulating layer and the gate electrode. The opening formed on the insulating layer has a first opening with a cross area decreasing towards the substrate and a second opening(34) with a cross area increasing towards the substrate.
申请公布号 KR20070024138(A) 申请公布日期 2007.03.02
申请号 KR20050078751 申请日期 2005.08.26
申请人 SAMSUNG SDI CO., LTD. 发明人 AHN, SANG HYUCK;LEE, CHUN GYOO;LEE, SANG JO;JEON, SANG HO;HONG, SU BONG;SHIN, JONG HOON
分类号 H01J1/304 主分类号 H01J1/304
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