ELECTRON EMISSION DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要
An electron emission device and a manufacturing method thereof are provided to minimize an interval between a gate electrode and an electron emission portion by forming openings on an upper portion of an insulating layer. A electron emission device includes a substrate; a cathode(12) formed on the substrate; a gate electrode(14) formed on the substrate, with an insulating layer(30) being interposed between the cathode and the gate electrode; an electron emission portion(16) formed on the cathode and exposed through openings(32) each formed on the insulating layer and the gate electrode. The opening formed on the insulating layer has a first opening with a cross area decreasing towards the substrate and a second opening(34) with a cross area increasing towards the substrate.
申请公布号
KR20070024138(A)
申请公布日期
2007.03.02
申请号
KR20050078751
申请日期
2005.08.26
申请人
SAMSUNG SDI CO., LTD.
发明人
AHN, SANG HYUCK;LEE, CHUN GYOO;LEE, SANG JO;JEON, SANG HO;HONG, SU BONG;SHIN, JONG HOON