| 摘要 |
A nozzle element of a head and a method of manufacturing the same using a semiconductor process are provided to precisely manufacture a chamber to improve fluid resistance and durability. A nozzle element of a head includes a plate member. The plate member includes a first outer side plate member, a center plate member, and a second outer side plate member. A chamber forming layer(2) and a nozzle forming layer(6) are sequentially formed on the plate member. A plurality of nozzle holes are formed at the nozzle forming layer to inject ink with a masking etching process. A plurality of chambers are formed at the chamber forming layer to supply the ink through the nozzle holes to form a nozzle member. The nozzle member is stuck to an end of the plate member to supply the ink and inject the ink. The nozzle forming layer is formed of silicon. The chamber forming layer is formed of silicon dioxide.
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