发明名称 VACUUM SYSTEM USED IN A SEMICONDUCTOR MANUFACTURING PROCESS
摘要 A vacuum system for use in a semiconductor manufacture process is provided to prevent damage of a high vacuum pump by using switching instruments for blocking a fore line pipe. High vacuum pumps(104a,104b) are connected to a vacuum pump where semiconductor process is performed. A roughing pump(106) is connected to the vacuum chamber through a roughing pipe(120). The roughing pump is connected to the high vacuum pump through fore line pipes(122a,122b). The fore line pipes are branched from the roughing pipe to be connected to the high vacuum pump. Fore line valves(134a,134b) are installed on the fore line pipes. Switching instruments(162a,162b) are directly connected to a power line to control an opening and shutting operation of the fore line valves according to a power supply to the roughing pump. The power line applies the power to the roughing pump.
申请公布号 KR20070024113(A) 申请公布日期 2007.03.02
申请号 KR20050078705 申请日期 2005.08.26
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JOO, YOUNG BYEONG;KIM, CHEOL JUNG
分类号 H01L21/02 主分类号 H01L21/02
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