发明名称 NOZZLE ELEMENT OF HEAD USING SEMICONDUCTOR PROCESS AND MANUFACTURING METHOD THEREOF
摘要 A nozzle element of a head using a semiconductor process and a method of manufacturing the same are provided to improve wear resistance by forming an adhesion layer, a protection layer, and a coating layer. A nozzle element of a head using a semiconductor process includes has a plate member. The plate member includes a first outer side plate member, a center plate member, and a second outer side plate member. A chamber forming layer(2), a depth adjustment layer(4), and a nozzle forming layer(6) are sequentially formed on the plate member. A plurality of nozzle holes(14) are formed at the nozzle forming layer with a masking etching process to inject ink. A plurality of chambers are formed at the chamber forming layer to supply the ink to the nozzle holes to manufacture a nozzle member. The nozzle member is adhered to an end portion of the plate member to supply and inject the ink.
申请公布号 KR20070024155(A) 申请公布日期 2007.03.02
申请号 KR20050078789 申请日期 2005.08.26
申请人 DIGITAL GRAPHICS INCORPORATION 发明人 CHOI, GWAN SU
分类号 B41J2/135 主分类号 B41J2/135
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