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发明名称
三五族半导体元件的内连铜导线与其制造方法
摘要
一种三五族半导体元件的内连导线与其制造方法。此内连导线是由第一黏着层、防止铜扩散之扩散阻障层、第二黏着层以及铜导线所构成。由于在内连导线与此三五族半导体元件之间配置了第一黏着层/扩散阻障层/第二黏着层的堆叠层结构,因此改善了扩散阻障层对其他材料的黏着性不佳的问题,从而增加元件的良率。
申请公布号
TW200709335
申请公布日期
2007.03.01
申请号
TW094128569
申请日期
2005.08.22
申请人
国立交通大学
发明人
李承士;张翼;张晃崇
分类号
H01L21/768(2006.01)
主分类号
H01L21/768(2006.01)
代理机构
代理人
詹铭文;萧锡清
主权项
地址
新竹市大学路1001号
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