| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an electron beam irradiation device having a simple constitution/structure, capable of irradiating an electron beam to a large domain efficiently. <P>SOLUTION: This electron beam irradiation device 1 has a constitution wherein a planar electron emission element 2 and a positioning means are provided in one chamber 4, and an irradiation object 12 is directly irradiated with an electron beam 11 emitted from the planar electron emission element 2. In the electron beam irradiation device 1, the planar electron emission element 2 has an emitter part constituted of a dielectric, and the first electrode and the second electrode to which a driving voltage for emitting electrons is applied, and the first electrode has a plurality of through holes formed on the first surface of the emitter part, for exposing the emitter part, and the surface of the first electrode facing to the emitter part on the circumferential part of the through holes is separated from the emitter part, and the electron beam 11 is emitted from the first surface of the emitter part through the through holes. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
