| 摘要 |
PROBLEM TO BE SOLVED: To provide a standard particle application apparatus capable of stably applying standard particles with suppressed variation of the deposition amount. SOLUTION: The standard particle application apparatus 10 comprises an aerosol generation part 3 for producing aerosol of standard particles 42 from a diluted solution 31 and a deposition tank 21 into which the aerosol of the standard particles 42 is introduced to deposit the standard particles 42 on an object 1 installed inside. A quartz oscillator 51 is arranged near the object 1, wherein, the opening or closing of a standard particle control valve 62 for adjusting the introduction amount of the standard particles 42 into the deposition tank 21 or a diluting water valve 64 for adjusting the supply amount of diluting water to the container 32 containing the diluted solution 31 is controlled from the deposition amount of the standard particles 42 on the quartz oscillator 51. COPYRIGHT: (C)2007,JPO&INPIT
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