发明名称 Insulating target material, method of manufacturing insulating target material, insulating complex oxide film, and device
摘要 An insulating target material for obtaining an insulating complex oxide film represented by a general formula AB<SUB>1-X</SUB>C<SUB>X</SUB>O<SUB>3</SUB>, an element A including at least Pb, an element B including at least one of Zr, Ti, V, W, and Hf, and an element C including at least one of Nb and Ta.
申请公布号 US2007045109(A1) 申请公布日期 2007.03.01
申请号 US20060511663 申请日期 2006.08.29
申请人 SEIKO EPSON CORPORATION 发明人 KIJIMA TAKESHI;HIGUCHI TAKAMITSU
分类号 C23C14/00 主分类号 C23C14/00
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