发明名称 Defect detecting method and defect detecting device
摘要 A defect detecting method includes: an image acquiring process for capturing an image of an inspection object having an identical sequence of pattern and acquiring the image; and a defect emphasizing process for emphasizing a defect of the captured image. The defect emphasizing process includes: an inspected-point selecting process for sequentially selecting an inspection point on the captured image; and a defect emphasizing value calculating process for obtaining differences by subtracting from a luminance value of the selected inspection point each luminance value of a plurality of comparison points disposed around the inspection point and selecting one difference of the smallest value of the obtained differences in luminance to determine a defect emphasizing value of the inspection point.
申请公布号 US2007047801(A1) 申请公布日期 2007.03.01
申请号 US20060510789 申请日期 2006.08.25
申请人 SEIKO EPSON CORPORATION 发明人 KOJIMA KOICHI;KANAZAWA EISUKE
分类号 G06K9/00 主分类号 G06K9/00
代理机构 代理人
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