发明名称 METHOD AND ARRANGEMENT FOR GENERATING AND CONTROLLING A DISCHARGE PLASMA
摘要 <p>Method and arrangement for controlling a discharge plasma in a discharge space (11) having at least two spaced electrodes (13, 14). A gas or gas mixture is introduced in the discharge space (11), and a power supply (15) for energizing the electrodes (13, 14) is provided for applying an AC plasma energizing voltage to the electrodes (13, 14). At least one current pulse is generated and causes a plasma current and a displacement current. Means for controlling the plasma are provided and arranged to apply a displacement current rate of change for controlling local current density variations associated with a plasma variety having a low ratio of dynamic to static resistance, such as filamentary discharges. By damping such fast variations using a pulse forming circuit (20), a uniform glow discharge plasma is obtained.</p>
申请公布号 WO2007024134(A1) 申请公布日期 2007.03.01
申请号 WO2006NL50209 申请日期 2006.08.24
申请人 FUJI PHOTO FILM B.V.;BOUWSTRA, JAN BASTIAAN;DE VRIES, HINDRIK WILLEM;ALDEA, EUGEN;VAN DE SANDEN, MAURITIUS CORNELIUS MARIA 发明人 DE VRIES, HINDRIK WILLEM;ALDEA, EUGEN;VAN DE SANDEN, MAURITIUS CORNELIUS MARIA
分类号 H05H1/24 主分类号 H05H1/24
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