发明名称 |
Depositing method for depositing absorber layers for thin-layer solar cells covers layer-forming elements in a vapor phase while depositing them on a substrate |
摘要 |
All layer-forming elements are cover-vapored in a vacuum working chamber (1), mixed in a vapor phase (11) and deposited on a substrate (3). During the vaporizing process, a plasma (13) is ignited and maintained in a space between a vaporizer's sources (9) and the substrate. An independent claim is also included for a device for depositing absorber layers for thin-layer solar cells. |
申请公布号 |
DE102005040087(A1) |
申请公布日期 |
2007.03.01 |
申请号 |
DE20051040087 |
申请日期 |
2005.08.24 |
申请人 |
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V. |
发明人 |
STRAACH, STEFFEN;KUHLISCH, STEPHAN;SCHILLER, NICOLAS |
分类号 |
H01L31/18;C23C14/24;C23C16/513;H01L31/0336;H01L31/0392 |
主分类号 |
H01L31/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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