发明名称 Depositing method for depositing absorber layers for thin-layer solar cells covers layer-forming elements in a vapor phase while depositing them on a substrate
摘要 All layer-forming elements are cover-vapored in a vacuum working chamber (1), mixed in a vapor phase (11) and deposited on a substrate (3). During the vaporizing process, a plasma (13) is ignited and maintained in a space between a vaporizer's sources (9) and the substrate. An independent claim is also included for a device for depositing absorber layers for thin-layer solar cells.
申请公布号 DE102005040087(A1) 申请公布日期 2007.03.01
申请号 DE20051040087 申请日期 2005.08.24
申请人 FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V. 发明人 STRAACH, STEFFEN;KUHLISCH, STEPHAN;SCHILLER, NICOLAS
分类号 H01L31/18;C23C14/24;C23C16/513;H01L31/0336;H01L31/0392 主分类号 H01L31/18
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