| 摘要 |
<p>Methods, systems, program products are disclosed that control placement of dummy shapes (200) about sensitive circuit elements (172) such that the dummy shapes are at least substantially similar for each circuit element even though the dummy shapes are auto-generated. In one embodiment, the invention includes providing dummy shape pattern pitch information (XP, YP) to a designer, and allowing placement of circuit elements at integer multiples of one or more of the pitches such that the dummy shapes are at least substantially similar about each instance of the circuit element. Another embodiment includes allowing placement of a marker (300) about a circuit element (372) to indicate an area in which dummy shapes (306) are to be substantially identical, and then using the marker to place the circuit element. Dummy shapes generated within the marker ensure substantially identical dummy shapes for each instance of the circuit element. The invention also includes the integrated circuits formed.</p> |
