发明名称 NONVOLATILE SEMICONDUCTOR MEMORY ELEMENT AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a nonvolatile semiconductor memory element and its manufacturing method. SOLUTION: The nonvolatile memory element comprises a switching element and a storage node connected to it. The storage node comprises a lower electrode, a data preservation layer, and an upper electrode. The data preservation layer comprises a first region where a current route is formed on a first voltage, and a second region enclosing the first region where a current route is formed on a second voltage that is higher than the first voltage. The first region contacts the upper and lower electrodes between them. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007053367(A) 申请公布日期 2007.03.01
申请号 JP20060220086 申请日期 2006.08.11
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 AHN SEUNG-EON;YUN JUNG-BIN;YOO IN-KYEONG;KIM DONG-CHUL;KIM TAE-HOON
分类号 H01L27/10 主分类号 H01L27/10
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