| 发明名称 |
Photosensitive resin composition and method for manufacturing semiconductor device using the same |
| 摘要 |
A photosensitive resin composition comprising: a quinone diazide sulfonic acid ester of a phenol compound represented by formula (I) as defined in the specification; and a polybenzoxazole precursor, and a method for manufacturing a semiconductor device using the same.
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| 申请公布号 |
US2007048656(A1) |
申请公布日期 |
2007.03.01 |
| 申请号 |
US20060511375 |
申请日期 |
2006.08.29 |
| 申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
SATO KENICHIRO;YAMANAKA TSUKASA |
| 分类号 |
G03C5/18 |
主分类号 |
G03C5/18 |
| 代理机构 |
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代理人 |
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