| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of optical element suitable for satisfactorily protecting a grid, flattening the surface and enlarging the usage with respect to an optical element provided with a wire grid. <P>SOLUTION: The manufacturing method of optical element comprises: a metal layer forming process of forming a metal layer 12 on a substrate 11A made of a light-transmissive dielectric material; a resist forming process of forming a chemically-amplified resist which has a striped flat surface pattern and contains a silylating agent on the formed metal layer 12; a working process of working the metal layer 12 into a striped flat surface pattern by the etching of using the resist as a mask; a dissolution process of dissolving residue resist remaining on the metal layer 12 to prepare dissolution resist which is wide-spread over the whole surface of the metal layer 12 after the etching; and a protective film forming process of silylating the dissolution resist and forming a protective film 14 by the dry etching using oxygen. <P>COPYRIGHT: (C)2007,JPO&INPIT |
