| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron gun having excellent illumination uniformity, and a charged particle beam exposure apparatus employing the same. SOLUTION: In the electron gun, the average surface roughness of an electron emitting surface of a cathode 1 is set at 1μm(p-p) to 30μm(p-p) and its variation is set at within a range of±50% of its average. Using this electron gun enables to increase an electron emitting angel, thereby increasing emittance. Accordingly, an image on a cathode surface on a shaping aperture is enlarged, thereby improving the illumination uniformity. COPYRIGHT: (C)2007,JPO&INPIT
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