发明名称 |
Trench transistor, e.g. for a semiconductor, has a semiconductor body, a trench structure, an electrode structure, a gate electrode structure and a field electrode structure |
摘要 |
<p>Embedded in a trench structure (3) and electrically insulated against a semiconductor body (2) by an insulating structure (5), an electrode structure has a gate electrode structure (4 1) and a field electrode structure (4 2) fitted beneath the gate electrode structure and electrically insulated by it. An independent claim is also included for a method for producing a trench transistor.</p> |
申请公布号 |
DE102005041256(A1) |
申请公布日期 |
2007.03.01 |
申请号 |
DE20051041256 |
申请日期 |
2005.08.31 |
申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
HIRLER, FRANZ;ZUNDEL, MARKUS;POELZL, MARTIN;ZELSACHER, RUDOLF |
分类号 |
H01L29/78;H01L21/336 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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