发明名称 Trench transistor, e.g. for a semiconductor, has a semiconductor body, a trench structure, an electrode structure, a gate electrode structure and a field electrode structure
摘要 <p>Embedded in a trench structure (3) and electrically insulated against a semiconductor body (2) by an insulating structure (5), an electrode structure has a gate electrode structure (4 1) and a field electrode structure (4 2) fitted beneath the gate electrode structure and electrically insulated by it. An independent claim is also included for a method for producing a trench transistor.</p>
申请公布号 DE102005041256(A1) 申请公布日期 2007.03.01
申请号 DE20051041256 申请日期 2005.08.31
申请人 INFINEON TECHNOLOGIES AG 发明人 HIRLER, FRANZ;ZUNDEL, MARKUS;POELZL, MARTIN;ZELSACHER, RUDOLF
分类号 H01L29/78;H01L21/336 主分类号 H01L29/78
代理机构 代理人
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