| 摘要 |
An exposure method for making a separator includes the steps of providing a substrate on which a positive photoresist is coated, providing a mask having a light-transmissible region and a light-blocking region, and performing first-time and second-time exposures respectively sequentially by using UV light obliquely irradiating on the mask with a respective included angle between a surface direction of the mask and an incident direction of the UV light.
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