| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a cleaning device for mask substrates, with which the whole end surface of a mask substrate and even an area where a pellicle has been stuck can be surely cleaned in the same chamber. <P>SOLUTION: The cleaning device has a chamber 2 and in the chamber, at least a substrate supporting means 3 which can rotatably support a mask substrate 5, a substrate cleaning solution supplying means 6, 7 for supplying a cleaning solution to the substrate supported by the substrate supporting means 3, a cleaning brush 8 capable of being brought into sliding contact with the upper surface 5a and the end surface 5b of the substrate supported by the substrate supporting means 3 while being rotated or not rotated, and a waste liquid port 10 for discharging waste liquid of the cleaning solution from the chamber. The substrate supporting means 3 has a plurality of supporting pins 4 for supporting the periphery of the mask substrate 5 and can rotate the substrate supported by the pins relatively to the supporting pins so that the periphery of the substrate is supported by the pins at different positions. <P>COPYRIGHT: (C)2007,JPO&INPIT |
