发明名称 Gate-all-around integrated circuit devices
摘要 Gate-all-around integrated circuit devices include first and second source/drain regions on an active area of an integrated circuit substrate. The first and second source/drain regions form p-n rectifying junctions with the active area. A channel region extends between the first and second source/drain regions. An insulated gate electrode surrounds the channel region.
申请公布号 US2007045725(A1) 申请公布日期 2007.03.01
申请号 US20060374644 申请日期 2006.03.13
申请人 YUN EUN-JUNG;LEE SUNG-YOUNG;KIM MIN-SANG;KIM SUNG-MIN 发明人 YUN EUN-JUNG;LEE SUNG-YOUNG;KIM MIN-SANG;KIM SUNG-MIN
分类号 H01L29/94;H01L29/76 主分类号 H01L29/94
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