发明名称 |
SUBSTRATE PROVIDED WITH LINEUP MARK IN SUBSTANTIALLY TRANSPARENT PROCESS LAYER, MASK FOR EXPOSING MARK, METHOD OF MANUFACTURING DEVICE, AND DEVICE MANUFACTURED THEREBY |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate having a mark whose position measurement accuracy is not deteriorated by the interference of a radiation reflected by the mark with the radiation returned to the mark after passing through a transparent layer and reflected on the surface of the substrate, when exposing the substrate having the transparent process layer with a mask in a lithography projection device at the time of irradiating a lineup mark provided in the transparent layer for arranging the substrate with lineup beam of the radiation. <P>SOLUTION: Lineup marks P<SB>1</SB>and P<SB>2</SB>in the transparent process layer of the substrate W include a region 3 of high reflection factor for reflecting the radiation of the lineup beam and region 1 of low reflection factor reflecting little radiation, and scattering structure 5 for scattering radiation of the lineup beam into the low reflection factor region and absorbing. Accordingly, it is rare that the lineup system is disturbed by the interference. <P>COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2007053407(A) |
申请公布日期 |
2007.03.01 |
申请号 |
JP20060311462 |
申请日期 |
2006.11.17 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
VAN HAREN RICHARD JOHANNES FRANCISCUS |
分类号 |
G03F1/08;H01L21/027;G03F7/20;G03F9/00 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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