发明名称 METHOD OF MANUFACTURING CONDUCTIVE LAYER
摘要 A method of manufacturing a conductive layer is described. A substrate having a dielectric layer thereon is provided. The dielectric layer has a patterned structure and the patterned structure exposes a portion of the conductive layer. The surface of the substrate is cleaned in a first cleaning step and a cap layer is formed over the exposed portion of the conductive layer. Thereafter, the surface of the substrate is cleaned again in a second cleaning step to remove the residual cap layer on the surface of the dielectric layer. Finally, a dry cleaning step is performed to clean and dry the surface of the substrate.
申请公布号 US2007049009(A1) 申请公布日期 2007.03.01
申请号 US20050162119 申请日期 2005.08.30
申请人 HSU CHIA-LIN;FANG LIANG-YUAN;CHEN SHU-JEN 发明人 HSU CHIA-LIN;FANG LIANG-YUAN;CHEN SHU-JEN
分类号 H01L21/4763;H01L21/44 主分类号 H01L21/4763
代理机构 代理人
主权项
地址