HOLDING APPARATUS, ASSEMBLY SYSTEM, SPUTTERING APPARATUS, MACHINING METHOD AND MACHINING APPARATUS

摘要

An electromagnetic chuck (20) supplies a specific microcoil among a plurality of microcoils (MC) with a current, and permits an electromagnetic force to operate to a material (M) in cooperation with a magnet of the material (M). Therefore, the material (M) can be held by having it positioned at a desired position on a base plane (a position corresponding to the microcoil supplied with the current). Furthermore, since lifting force is applied to the material (M) by a gas jetted from a gas supply path (42), influence of a frictional force operated between the material (M) and an upper plane of the electromagnetic chuck when positioning the material (M) can be reduced.