发明名称 |
AN APPARATUS AND METHOD FOR NON-CONTACT ASSESSMENT OF A CONSTITUENT IN SEMICONDUCTOR SUBSTRATES |
摘要 |
<p>Methods and apparatus for assessing a constituent in a semiconductor substrate. Several embodiments of the invention are directed toward non-contact methods and systems for identifying an atom specie of a dopant implanted into the semiconductor substrate using techniques that do not mechanically contact the substrate with electrical leads or other types of mechanical measuring instruments. For example, one embodiment of a non-contact method of assessing a constituent in a semiconductor substrate in accordance with the invention comprises obtaining an actual reflectance spectrum of infrared radiation reflected from the semiconductor substrate, and ascertaining a plasma frequency value (?<SUB>p</SUB> ) and a collision frequency value (?) for the semiconductor substrate based on the actual reflectance spectrum. This method can further include identifying a dopant type based on a relationship between dopant types and (a) plasma frequency values and (b) collision frequency values.</p> |
申请公布号 |
WO2007024332(A2) |
申请公布日期 |
2007.03.01 |
申请号 |
WO2006US25174 |
申请日期 |
2006.06.27 |
申请人 |
ACCENT OPTICAL TECHNOLOGIES, INC.;VAGOS, PEDRO |
发明人 |
VAGOS, PEDRO |
分类号 |
H01L21/336 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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