发明名称 |
WAFER PROTECTION SYSTEM EMPLOYED IN CHEMICAL STATIONS |
摘要 |
Semiconductor wafers have ashed photoresist residue and/or post-etch residue thereon to be cleaned through the chemical wet station, and a pattern of exposed metal layer. Post-etch residue removing solvent such as EKC-270 is fed into the solvent tank through a first solvent valve and first liquid feeding conduit that connected to bottom of the solvent tank. A circulation conduit connects the solvent tank with the first liquid feeding conduit for circulating the post-etch residue removing solvent. A liquid feeding pump is connected with the first liquid feeding conduit. A liquid drain conduit and a drain valve are connected with bottom of the solvent tank. Replacement solvent such as EKC-800 is fed into the solvent tank through a second solvent valve and second liquid feeding conduit.
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申请公布号 |
US2007044817(A1) |
申请公布日期 |
2007.03.01 |
申请号 |
US20050162146 |
申请日期 |
2005.08.30 |
申请人 |
CHEN SAN-LUNG;CHEN YING-FANG;CHU KUO-ZHANG;TSENG MEI-LUN |
发明人 |
CHEN SAN-LUNG;CHEN YING-FANG;CHU KUO-ZHANG;TSENG MEI-LUN |
分类号 |
C23G1/00;B08B3/00;B08B3/12 |
主分类号 |
C23G1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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