发明名称 RESIN COMPOSITION FOR BUMP FORMATION, BILAYER LAMINATED FILM FOR BUMP FORMATION, AND METHOD FOR FORMING BUMP
摘要 <P>PROBLEM TO BE SOLVED: To provide a negative radiation sensitive bilayer laminated film for bump formation excellent in the printability of solder paste and pattern profile and easy to peel from a substrate, and a method for producing bumps using the same. <P>SOLUTION: A composition for a lower layer film of a bilayer laminated film used for bump formation is prepared which comprises (A) an alkali-soluble copolymer having a specific structural unit typified by poly-p-hydroxyphenylacrylamide and (B) an organic solvent. The bilayer laminated film is produced using the composition. Bumps are formed using the laminated film. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007052351(A) 申请公布日期 2007.03.01
申请号 JP20050238794 申请日期 2005.08.19
申请人 JSR CORP 发明人 YOKOYAMA KENICHI;SAKAI YOKO;HASEGAWA SATOMI;OTA KATSU;IWANAGA SHINICHIRO
分类号 G03F7/11;G03F7/004;G03F7/26;G03F7/40;H01L21/60 主分类号 G03F7/11
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