| 摘要 |
A vacuum evacuation device 2 of the invention comprises a vacuum pump 4,5 for exhausting a gas G 2 in a process chamber 21 into which a process gas G 1 is introduced and in which a process reaction is performed, to form a vacuum in said process chamber 21 ; and a control means 6 for performing a first control that regulates the rotational speed of said vacuum pump 4,5 such that a pressure condition in said process chamber 21 reaches a pressure condition suitable for said process reaction during said process reaction, wherein said control means 6 calculates a specified rotational speed for said vacuum pump 4,5 based on process information related to said process reaction, and performs a second control that brings said vacuum pump 4,5 to said specified rotational speed before said first control. The vacuum evacuation device 2 is capable of bringing the pressure in a process chamber 21 to the target pressure in a short period without a vacuum pump 4,5 being overloaded, regardless of the process reaction condition.
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