Pattern inspection apparatus, pattern inspection method, and program-recorded readable recording medium

摘要

It is an object of the present invention to provide a method and apparatus for performing pattern inspection which reduces the number of pseudo defects. A pattern inspection apparatus according to an embodiment of the present invention comprises an optical image acquiring unit which acquires optical image data of a target plate to be inspected, the target plate being formed as a pattern, a design image data generating unit which generates first design image data based on a first design pattern serving as a base for pattern formation of the target plate, and a comparing unit which compares the optical image data with the first design image data. In the comparing unit, second design image data generated based on a second design pattern is further input, and the optical image data is compared with the second design image data in place of the first design image data.