IMPLANTED ISOLATION REGION FOR IMAGER PIXELS

摘要

A pixel cell array architecture having ion implant regions as isolation regions between adjacent active areas of pixels in the array. In one exemplary embodiment, the invention provides an ion-doped p-well region separating n-type photosensitive areas of neighboring pixel cells. The pixel cells have increased fill factor without encountering the disadvantages associated witih. conventional shallow trench isolation regions.