发明名称 TARGET ASSEMBLY AND SPUTTERING APPARATUS PROVIDED WITH THE TARGET ASSEMBLY
摘要 PROBLEM TO BE SOLVED: To provide a target assembly which is made by jointing a target with a backing plate through a bonding material, but makes the jointed surface between the target and the backing plate not to be exposed to plasma when the target assembly is sputtered, and consequently prevents overdischarge from occurring while the target assembly is sputtered. SOLUTION: This target assembly makes an area of the jointed surface between the targets 31a to 31f to be sputtered having a predetermined shape and the backing plates 32a to 32f smaller than the maximum cross sectional area of the target. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007051308(A) 申请公布日期 2007.03.01
申请号 JP20050235130 申请日期 2005.08.15
申请人 ULVAC JAPAN LTD 发明人 OISHI YUICHI;KOMATSU TAKASHI;NAKAMURA HAJIME;ARAI MAKOTO;KIYOTA JUNYA;TANI NORIAKI
分类号 C23C14/34 主分类号 C23C14/34
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