Manufacturing methods of fine cerium oxide particles and its slurry for shallow trench isolation process of semiconductor,申请号KR20050077456-传众专利搜索

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发明名称	Manufacturing methods of fine cerium oxide particles and its slurry for shallow trench isolation process of semiconductor
摘要
申请公布号	KR20070023163(A)	申请公布日期	2007.02.28
申请号	KR20050077456	申请日期	2005.08.23
申请人		发明人
分类号	C09K3/14	主分类号	C09K3/14
代理机构		代理人
主权项
地址

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