Plasma evaporation source with cathodic electrode for vacuum coating system,申请号EP20010112774-传众专利搜索

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发明名称	Plasma evaporation source with cathodic electrode for vacuum coating system
摘要
申请公布号	EP1162647(B1)	申请公布日期	2007.02.28
申请号	EP20010112774	申请日期	2001.05.28
申请人	SATIS VACUUM INDUSTRIES VERTRIEBS - AG	发明人	SIEGRIST, BEAT
分类号	C23C16/503;H01J37/32	主分类号	C23C16/503
代理机构		代理人
主权项
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