| 摘要 |
One embodiment disclosed relates to an apparatus for inspecting or revieiwing a mask or reticle. The apparatus includes at least an optical system, a converter plate, and an electron system. The optical system projects an optical illumination onto the mask. The optical signal from the mask is received by the converter plate. The converter plate transforms the optical signal to a corresponding electron signal. The electron signal is imaged by the electron system.
|
