发明名称 |
Method of fabricating dual damascene interconnections of microelectronic device using hybrid low k-dielectric and carbon-free inorganic filler |
摘要 |
A method of fabricating dual damascene interconnections is provided. A dual damascene region is formed in a hybrid dielectric layer having a dielectric constant of 3.3 or less, and a carbon-free inorganic material is used as a via filler. The present invention improves electrical properties of dual damascene interconnections and minimizes defects.
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申请公布号 |
US7183195(B2) |
申请公布日期 |
2007.02.27 |
申请号 |
US20030625007 |
申请日期 |
2003.07.23 |
申请人 |
SAMSUNG ELECTRONICS, CO., LTD. |
发明人 |
LEE KYOUNG-WOO;LEE SOO-GEUN;PARK WAN-JAE;KIM JAE-HAK;SHIN HONG-JAE |
分类号 |
H01L21/4763;H01L21/768 |
主分类号 |
H01L21/4763 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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