| 摘要 |
An image device is provided to form a micro lens with curvature without using an additional reflow process by forming a micro lens composed of a photoresist pattern and a photoresist layer for coating the photoresist pattern. A semiconductor substrate(100) includes a plurality of pixel regions. A micro lens(130) is formed on the semiconductor substrate, corresponding to each one of the plurality of pixel regions and composed of a photoresist pattern(110) and a photoresist layer(120) covering the surface of the photoresist pattern. The sidewall of the photoresist pattern has a vertical profile with respect to the surface of the substrate.
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