发明名称 Horizontal tram
摘要 An integrated circuit structure includes providing a semiconductor substrate and forming a trench therein. A thyristor is formed around the trench and within the semiconductor substrate. The thyristor has at least four layers with three P-N junctions therebetween. A gate for the thyristor is formed within the trench. An access transistor is formed on the semiconductor substrate. An interconnect is formed between the thyristor and the access transistor.
申请公布号 US7183590(B2) 申请公布日期 2007.02.27
申请号 US20060422560 申请日期 2006.06.06
申请人 CHARTERED SEMICONDUCTOR MANUFACTURING LTD. 发明人 ZHENG JIA ZHEN;LI WEINING;CHAN TZE HO SIMON;YELEHANKA PRADEEP RAMACHANDRAMURTHY
分类号 H01L29/74;H01L21/332;H01L21/8244;H01L27/06;H01L27/11 主分类号 H01L29/74
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