BUFFER DRESSER CLEANING DEVICE OF CHEMICAL MECHANICAL POLISHING AND METHOD THEREOF

摘要

An apparatus for cleaning a buffer dresser in a CMP process is provided to reduce damages caused by acid by rapidly neutralizing an acid component formed on a diamond layer of a buffer dresser exposed to acid after a buffer pad conditioning process. A first cleaning solution(322) for firstly cleaning a diamond layer(212) of a buffer dresser(210) is stored in a first cleaning solution storing part(320). A first cleaning injecting part is composed of an injection nozzle having at least one hole for injecting the first cleaning solution supplied from the first cleaning solution storing part to the diamond layer of the buffer dresser. A second cleaning solution(342) for secondly cleaning the diamond layer of the buffer dresser to which the first cleaning solution has been injected is stored in a second cleaning solution storing part(340) which is installed in addition to the first cleaning solution storing part. The first cleaning solution includes NH4OH. The second cleaning solution is made of deionized water.