Method For Forming Dielectric film For Semiconductor device,申请号KR20040117311-传众专利搜索

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发明名称	Method For Forming Dielectric film For Semiconductor device
摘要
申请公布号	KR100687903(B1)	申请公布日期	2007.02.27
申请号	KR20040117311	申请日期	2004.12.30
申请人		发明人
分类号	H01L21/314;H01L21/336	主分类号	H01L21/314
代理机构		代理人
主权项
地址

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