发明名称 Method for manufacturing electro-optical device, electro-optical device, and electronic apparatus
摘要 A method is provided for manufacturing an electro-optical device, in which fine scratches or cracks can be removed by etching without damaging wiring, an electro-optical device, and an electronic apparatus. According to the method, a liquid crystal panel used in an electro-optical device is cut as a single product. Then, before an IC mounting step, in a state of the single product liquid crystal panel, a wet etching is performed on the cut faces and edges of the first and second substrates to remove fine scratches or cracks from the cut faces and edges of the substrates. At this time, wiring portions, IC mounting terminals, substrate mounting terminals, and alignment marks, which are formed on the protruding region, are covered with a protection layer.
申请公布号 US7182877(B2) 申请公布日期 2007.02.27
申请号 US20030732198 申请日期 2003.12.10
申请人 SEIKO EPSON CORPORATION 发明人 MURAI HIDETOSHI;HANAKAWA MANABU
分类号 B29D11/00;G02F1/13 主分类号 B29D11/00
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