发明名称 VAPOR DEPOSITION APPARATUS, AND SYSTEM FOR MANUFACTURING DISPLAY UNIT
摘要 PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus which sufficiently inhibits a temperature of an evaporation source from rising and enhances the accuracy of a vapor-depositing position, and to provide a system having the vapor deposition apparatus for manufacturing a display unit. SOLUTION: This vapor deposition apparatus has a crucible 110A for accommodating a vapor deposition material 100 therein arranged inside a case 110, and a heat source 120 arranged around the case 110. The case 110 has a salient 111 formed on the top surface, and a thermal protection member 130 is arranged so as to be adjacent to the salient 111. A first tilting part 113 is prepared around the salient 111 formed at the top surface of the case 110, so as to descend towards distant parts from the salient 111; and a second tilting part 131 is formed along the first tilting part 113, on the side of the thermal protection member 130, which faces to the first tilting part 113. Thus formed vapor deposition apparatus can make the thermal protection member 130 thick, and consequently acquires an enhanced capability of intercepting radiant heat to sufficiently inhibit the temperature from rising; and can prepare a space in the vicinity of the top surface of the case 110 and can arrange the thermal protection member 130 in the space. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007046100(A) 申请公布日期 2007.02.22
申请号 JP20050231101 申请日期 2005.08.09
申请人 SONY CORP 发明人 WATANABE HIROYUKI;DOI NORIAKI;SUZUKI HIDEAKI
分类号 C23C14/24;H01L51/50;H05B33/10 主分类号 C23C14/24
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