| 摘要 |
PROBLEM TO BE SOLVED: To provide a mask holder and a substrate holder which are used in a vacuum vapor deposition apparatus having a mask used for forming a predetermined pattern on a substrate by vapor deposition and having a mask holder for holding the mask, and inhibit the mask holder and the substrate holder from causing the displacement of the relative position. SOLUTION: The mask holder 5 is provided with a friction pad 2, and the substrate holder 3 is also provided with a friction pad 17. The friction pad 2 and the friction pad 17 are placed at such a position that they can abut on each other. The friction pad is made from rubber or an elastomer. COPYRIGHT: (C)2007,JPO&INPIT
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