发明名称 POSITIONING APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a positioning apparatus for accurately positioning devices installed in different vacuum chambers to predetermined relative positions, moreover a positioning apparatus for accurately positioning an exposure device body and a light source device of the exposure apparatus used for manufacturing a semiconductor device to the predetermined relative positions, and an exposure apparatus comprising such a positioning apparatus, and also to provide a device manufacturing method using the exposure apparatus. <P>SOLUTION: In the positioning apparatus, at least either of a first apparatus and a second apparatus is accommodated in the chamber, and a relative positioning function is also provided between the first apparatus and the second apparatus. The relative position is measured as at least one degree of freedom between the first apparatus and the second apparatus. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007048932(A) 申请公布日期 2007.02.22
申请号 JP20050231576 申请日期 2005.08.10
申请人 CANON INC 发明人 UZAWA SHIGEYUKI;MAEHARA YUJI
分类号 H01L21/027;G03F9/00;H01L21/68 主分类号 H01L21/027
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