发明名称 DETECTING METHOD OF PROGRESS OF ETCHING
摘要 PROBLEM TO BE SOLVED: To provide a detecting method of the progress of etching which can detect the progress of etching by capturing a change in the hue of a processed part of a workpiece to be etched. SOLUTION: An etching process performs a hue acquiring step for acquiring information about the hue of the processed part by color measurement, and a progress-of-etching detecting step wherein the progress of etching is detected based on the information about the hue acquired in the hue acquiring step, and information about the hue transition of the processed part which is changed with the progress of etching. In the progress-of-etching detecting step, the progress of etching is detected based on the position of the acquired hue information in the hue transition information which is expressed by a distribution map. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007048886(A) 申请公布日期 2007.02.22
申请号 JP20050230903 申请日期 2005.08.09
申请人 SEIKO EPSON CORP 发明人 OGURI MINORU
分类号 H01L21/3065 主分类号 H01L21/3065
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