| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and a device for refining ultrapure water, wherein from ultrapure water used in a wet cleaning stage for cleaning the surface of an electronic material such as a silicon substrate for a semiconductor, impurities stuck to the surface of the electronic material and having an anxiety of reducing the performance of a semiconductor in the following stage are removed in a high degree, so as to remarkably contribute to the yield of a semiconductor product. SOLUTION: In the method for refining ultrapure water, ultrapure water is brought into contact with granular silicon and/or granular silicon oxide and thereafter with a structure having ion-exchange ability and adsorption ability. The device for refining ultrapure water is provided with: a packed bed; and a structure having ion-exchange ability and adsorption ability provided at the poststage of the packed bed. COPYRIGHT: (C)2007,JPO&INPIT
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