Method and device for feeding a chemical-mechanical polishing machine with a polishing product

摘要

In a chemical-mechanical polishing machine, polishing product comprising abrasive particles suspended in a reactive liquid is fed to the machine for use in a polishing operation that is divided into at least a first step and a second step. During the second step, the polishing machine is fed via a filter with a product containing fewer large particles than the product feeding the polishing machine during the first step. The feed device may be formed of two parallel lines which are provided with valves. At least one of those lines is provided with the filter.