发明名称 INSPECTION DEVICE WITH CHARGED PARTICLE BEAM AND DEVICE MANUFACTURING METHOD USING INSPECTION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a flaw inspection method equipped with an enhanced throughput capable of precluding a crosstalk between a plurality of electron beams and leading the discharged secondary electrons efficiently to a detector. SOLUTION: The apparent angle on a specimen surface 1010 viewed from an objective lens is determined from the aperture angle and the magnification at the image surface 1005 of secondary electrons, and the receiving angle at the specimen surface is determined from the obtained apparent angle, the initial energy of the secondary electrons and the beam potential of the objective lens, followed by determining the yield of the secondary electrons on the basis of the obtained receiving angle, and on the basis of the resolution decided by the aperture angle, the spacing of irradiation with adjoining primary electron beams is separated to a distance or more which does not present a problem of crosstalk. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007048754(A) 申请公布日期 2007.02.22
申请号 JP20060232088 申请日期 2006.08.29
申请人 EBARA CORP 发明人 NAKASUJI MAMORU;NOMICHI SHINJI;SATAKE TORU;KANEUMA TOSHIFUMI;SOFUGAWA TAKUJI;YOSHIKAWA SEIJI;KARIMATA TSUTOMU;OWADA SHIN;NISHIFUJI MUTSUMI;HAMASHIMA MUNEKI;TAKAGI TORU
分类号 H01J37/28;G01N23/225;H01J37/147;H01L21/66 主分类号 H01J37/28
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