ELECTRON BEAM IRRADIATION DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an electron beam irradiation device capable of processing a work by an electron beam easily, excellently at low cost without enlarging the device. SOLUTION: This device is provided with: a vacuum chamber 3; an electron beam generation device for generating an electron beam in the vacuum chamber 3; an electron beam emission hole 8 for connecting the inside and the outside of the vacuum chamber 3 and allowing the electron beam EB emitted from the electron beam generation device to pass to the outside of the vacuum chamber 3; a nozzle 22 for enclosing the periphery of the electron beam emission hole 8 outside the vacuum chamber 3 and having an opening part 22a on a portion opposite to the electron beam emission hole 8; the first process gas supply device 11 for supplying inert gas into the nozzle 22; and the second process gas supply device 12 for supplying dry air into the nozzle 22. The nozzle 22 is provided with an enlarged part 22c (mixer) where the inert gas supplied from the first process gas supply device 11 and the dry air supplied from the second process gas supply device 12 are supplied and mixed. COPYRIGHT: (C)2007,JPO&INPIT